Karl Suss MJB3 Mask Aligner

Karl Suss

Product ID: 11038

Category: Front-End Processing Equipment

Equipment Type: Mask Aligners

Usage History: Refurbished

Current State: Functional - Installed Demonstrable

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Equipment Details

The Karl Suss MJB 3 Mask Aligner is designed for high resolution photolithography in a laboratory, development or pilot production environment. The MJB 3 offers unsurpassed flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as standard size wafers up to 3" in diameter.
Microscope:M400 Normalfield with revolving objective turret and trinocular microscope head
Microscope Objectives:Leitz NPL 5X, 10X, and 20X objectives
Microscope Oculars:10X eyepieces
Lamphouse:350W lamphouse
Lamp:350W High Pressure Mercury (Hg) lamp is currently installed
Exposure Optics:UV400
Optical Sensor:CH1: 365nm, CH2: 405nm
Timer:Digital
CIC Power Supply:CIC 1000 constant intensity controller

NOTE:THIS MJB 3 CAN ALSO BE ORDERED FOR THE FOLLOWING CONFIGURATIONS:
DUV APPLICATIONS (254nm) IR ALIGNMENT.PLEASE CONTACT US FOR DETAILS AND PRICING
Tooling:Includes one (1) set of standard mask holder and matching wafer alignment chuck to customer''s desired wafer size
Vib/Iso Table:Sold separately; subject to availability at time of order


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