Surface Technology Systems (STS) Multiplex Reactive Ion Etcher (RIE)

Surface Technology Systems (STS)

Product ID: 11050

Category: Front-End Processing Equipment

Equipment Type: Etchers / Ashers

Usage History: Refurbished

Current State: Functional - Installed Demonstrable

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Equipment Details

The Surface Technology Systems Multiplex range of plasma systems combine a single wafer or batch vacuum load lock with STS etch plasma source to produce a platform of unrivaled quality and reliability for both R&D and pilot-production applications.

SYSTEM DESCRIPTION: Surface Technology Systems Multiplex Reactive Ion Etcher (RIE) designed for etching of 3-8 inch GaAs wafers. System can be configured with Multiplex Atmospheric Cassette System (MACS wafer handling module shown in photo; upgrade option; subject to availability). System includes: load lock, PC-controlled RIE process chamber, power distribution cabinet, RF rack, remote gas box, and chiller.

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