Nanometrics AFT-210 Thin Film Measurement System

Nanometrics

Product ID: 11970

Category: Front-End Processing Equipment

Equipment Type: Mask & Wafer Inspection

Usage History: Refurbished

Current State: Functional - Disassembled Demonstrable

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Equipment Details

Nanometrics 210 thin film measurement tool: 480-850 nm reflection spectrum

Designed for silicon substrates; others allowed, but accuracy not guaranteed
150 A to tens of microns thickness measurements
Manual wafer placement, up to 6" wafers
Objectives of 5x, 10x, and 20x for 40 um, 20 um, and 10 um spot sizes.; can measure film properties in small areas
Thicker films require lower objective magnification due to depth of focus
Programs for photoresist, SiO2, SiN on silicon
Manufacturer: Nanometrics
Name/Model: 210
Reference: R-4665
All equipment sold is carefully tested and backed by a 60 day parts warranty. Exceptions to the warranty coverage include lamps, laser tubes, and consummable items


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